When using monolithic targets, molybdenum comes into direct contact with the cooling water from the coating system. Usually, the cooling water is prepared for the use of monolithic targets with suitable additives, so-called inhibitors. These stabilize the pH value of the cooling water and prevent the molybdenum from corroding. A patent-pending polymer-based internal coating from Plansee, which has been specially developed for monolithic rotary targets, prevents direct contact between the coating material and the cooling water. This is a huge advantage, as it means considerably fewer inhibitors are required in the production of CIGS solar cells and TFT LCD screens, thereby saving costs. The durable internal coating is so thin that it does not noticeably affect the thermal conductivity of the rotary target and continues to guarantee excellent sputtering performance.

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Rotatable Sputtering Target

Rotary sputtering target technology has been widely used in thin film deposition, especially for large area coating, such as architectural glass and flat panel displays coating manufacturing. The standard manufacturing methods are plasma spraying onto the base tubes, casting, and extrusion of the complete assembly.

Rotary Target Advantages

Comparing with planar sputtering target , the rotary sputter target contains more material and offers a greater utilization, which means longer production runs and reduced downtime of the system, increases the throughput of the coating equipment. Besides, rotatable targets allow the use of higher power densities due to the heat build-up being spread evenly over the surface area of the target. As a consequence, an increased deposition speed can be seen along with improved performance during reactive sputtering.

Rotary Target Manufacturing Methods

Stanford Advanced Materials provides the custom-made cylindrical rotary sputtering targets, mainly Cr, Ag, Al, Si, Sn, Ti, Stainless steel, TiO2, W, Ta, Mo, Nb, Cu and other metal and alloy materials.

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Sprayed: SAM provides thermally sprayed rotary targets providing optimal process stability and performance, including plasma, arc and cold spray production method. The main materials are AZO, ITO, Mo, Si, TiOx, ZnO, and ZTO.

Cast: Main advantages are high compositional and microstructural consistency and purity control, which contribute to high process yield and long target life. Products include InSn, Sn alloys, ZnAl and ZnSn materials.

Extruded: SAM is an established supplier of high-purity extruded Al, Cu, Mo, Nb, Ta, Ti, Zr, V and other materials with good purity and grain size.

HIP/Sintered: HIP products include Cr, Mo, ITO, AZO and ZnO sputtering targets.

Rotary Target Products